硒化鋅材料對熱沖擊具有很高的承受能力, 使它成為高功率CO2激光器系統中的*佳光學材料。硬度只是多光譜級ZnS的2/3, 材質較軟易產生劃痕, 而且材料折射率較大, 所以需要在其表面鍍制高硬度減反射膜來加以保護并獲得較高的透過率。在其常用光譜范圍內, 散射很低。在用做高功率激光器件時, 需要嚴格控制材料的體吸收和內部結構缺陷, 并采用*小破壞程度的拋光技術和光學質量的鍍膜工藝。

廣泛應用于激光,醫學，天文學和紅外夜視等領域中。

訂購型號:MPZNSEBS50.8-50.8

參數：

IR Polished Zinc Selenide (ZnSe) beamsplitter

50.8 x 50.8 x 3mm 45° beamsplitter.

50% transmission / 50% reflection @45° for 2-14µm

參數詳細信息：

No = Ordinary Ray

關于晶體切割：

During Chemical Vapour Deposition the small crystallite grains align with the direction of growth, and are

normal to the thickness of the sheet produced. For windows of normal thickness and aspect ratios the alignment of the grain therefore is rarely a problem as they are cut from the grown sheet such that within an optical window the grains align perpendicular to the surfaces. This is optimum orientation for lowest internal absorption and scatter.

With prisms, the cutting direction requires more consideration. It is recommended that the thickness of the strip material corresponds to the apex height of the prism. This ensures optimum crystallite orientation for most usual

prism applications.

For typical 45° prisms the most obvious use of material is shown in (A) but it

should be noted that this is not the optimum orientation.

The best choice is (B) and it also permits a higher limit on prism size or conversely allows thinner stock to be used. There is waste at the ends of the strip but this is small and so it may not be quite as economic as (A).

Cutting in direction (C) where the entire light beam runs at 90° to the grain

structure should be avoided completely if at all possible. Note that maximum available thickness of ZnSe and ZnS (FLIR) is approximately 60mm. Maximum available thickness of ZnS Cleartran is approximately 30mm

更新時間：2023/5/24 17:35:17